The RadTech 2020 conference continues into its second day with 12 concurrent sessions, including Industry 4.0, 3D Printing, Exterior Coatings, Hybrid/Dual-Cure and more.
The early morning sessions begin at 8 a.m., starting with three concurrent sessions: Industry 4.0, Measurement and Material Durability and Specification Testing.
Industry 4.0 begins with David Ivarsson, Efsen UV & EB Technology; Darrin Leonhardt, Heraeus Noblelight America; and Mike Gharagozloo, Heraeus Noblelight America. Measurement will feature Dominik Stephan, Dymax; Jim Raymont, EIT Instruments; and Robin E. Wright, Wright Way UV Consulting LLC.
Material Durability and Specification Testing will have a panel featuring Chris, Seubert, Ford Motor Company; Mary Ellen Rosenberger, BaySpring Solutions, LLC; Michael Dvorchak, Dvorchak Enterprises LLC. That session will be followed by Introduction to the Basics of UV/EB Curing, led by Dr. Idacavage.
After the break, the conference will have sessions on 3D Printing, Exterior Coatings, and New Product Debut II.
3D Printing will feature presenters Brendan McGrail, Sartomer; Amelia Davenport, Colorado Photopolymer Solutions; Forough Z. Shahraki, Eastern Michigan University; and Kyle Snow, Sartomer. Exterior Coatings will be discussed by Anna Johnson, Arkema; Arun Patel, Everlight USA; and Jonathan Shaw, allnex.
New Product Debut II will have short talks by Michael Kiehnel, BCH; Dhara Metla, BYK USA; Bob Lin, Evonik; James Gacek, Chitec Technology Co.; Norihito Nishimura, Showa Denko; James Goodrich, Miwon North America; Jim Raymont, EIT, LLC; and Keith Cordero, Ushio Americas.
After lunch, the three concurrent sessions will be Formulating for 3D Printing, Wood & Building Products and RadLaunch Presentations.
Formulating for 3D Printing will feature talks by Paul Share, Advanced Materials Design; Caitlyn Cook, Lawrence Livermore National Laboratory; Nathan Noyes, Croda; and Allan Guymon, University of Iowa.
Wood & Building Products led by Aurelien Hermann, University Laval; Jonathan Shaw, allnex; Kevin Nance, Alberdingk Boley; and Chloe Paquet, Universite Laval.
RadLaunch Presentations will feature Kevin Barnett, Pyran; David Walker, Azul3D; Thomas Hafkamp, Eindhoven University of Technology; Kangmin Kim, University of Colorado; Ian Hosein, Syracuse University; and Hamidreza Asemani, Eastern Michigan University.
After the break, the second day closes with three topics: Advanced Materials for 3D Printing, Adhesion to Difficult Substrates and Hybrid/Dual-Cure.
Advanced Materials for 3D Printing will be led by Roberto Bianchi, RadLab AG; Roumanie Marilyne, CEA/LITEN; Yann Stolz, Sartomer; and Sébastien Vry, CEA/LITEN.
Adhesion to Difficult Substrates will have Chakrapani Srinivasan, IGM Resins; Christopher MacNeil, Sartomer Americas; and William C. Miles, Penn Color.
The Hybrid/Dual-Cure session will feature Chris Baumgart, Red Spot Paint and Varnish; Chris Davis, IST America; Jon Scholte, Sartomer Americas; and Sage Schissel, PCT Ebeam and Integration, LLC.
Radtech
RadTech 2020 Heads Into Its Second Day
There will be 12 concurrent sessions, including Industry 4.0, 3D Printing, Exterior Coatings, Hybrid/Dual-Cure and more.
By: IWM Staff
